发明名称 |
NON-INTRUSIVE PLASMA MONITORING SYSTEM FOR ARC DETECTION AND PREVENTION FOR BLANKET CVD FILMS |
摘要 |
Methods and systems of diagnosing an arcing problem in a semiconductor wafer processing chamber are described. The methods may include coupling a voltage probe to a process-gas distribution faceplate in the processing chamber, and activating an RF power source to generate a plasma between the faceplate and a substrate wafer. The methods may also include measuring the DC bias voltage of the faceplate as a function of time during the activation of the RF power source, where a spike in the measured voltage at the faceplate indicates an arcing event has occurred in the processing chamber. Methods and systems to reduce arcing in a semiconductor wafer processing chamber are also described.
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申请公布号 |
KR20080036238(A) |
申请公布日期 |
2008.04.25 |
申请号 |
KR20087006984 |
申请日期 |
2006.08.16 |
申请人 |
APPLIED MATERIALS INC. |
发明人 |
SOO JYR HONG;NGUYEN VU NGOC TRAN;REITER STEVEN;FOSTER JASON;KIM, BOK HOEN;M'SAAD HICHEM |
分类号 |
H01J37/32;C23C16/00;H05H1/24 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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