发明名称 |
NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a non-volatile semiconductor storage device with little variation in electric characteristics among memory cells. SOLUTION: A floating gate electrode 7 provided on a substrate 1 comprises two or more kinds of materials with different carrier capturing efficiencies. The carrier is accumulated at the floating gate electrode 7 for storing data to constitute a region with little variation of a threshold voltage. The part with little variation is used as a margin for circuit operation, for less variation among cells and faster operation.
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申请公布号 |
JP2002184873(A) |
申请公布日期 |
2002.06.28 |
申请号 |
JP20000347480 |
申请日期 |
2000.11.15 |
申请人 |
SONY CORP |
发明人 |
KAWASHIMA NORIYUKI;TAIRA KENICHI |
分类号 |
H01L21/8247;G11C11/56;G11C16/04;H01L21/28;H01L27/115;H01L29/423;H01L29/49;H01L29/51;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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