发明名称 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a non-volatile semiconductor storage device with little variation in electric characteristics among memory cells. SOLUTION: A floating gate electrode 7 provided on a substrate 1 comprises two or more kinds of materials with different carrier capturing efficiencies. The carrier is accumulated at the floating gate electrode 7 for storing data to constitute a region with little variation of a threshold voltage. The part with little variation is used as a margin for circuit operation, for less variation among cells and faster operation.
申请公布号 JP2002184873(A) 申请公布日期 2002.06.28
申请号 JP20000347480 申请日期 2000.11.15
申请人 SONY CORP 发明人 KAWASHIMA NORIYUKI;TAIRA KENICHI
分类号 H01L21/8247;G11C11/56;G11C16/04;H01L21/28;H01L27/115;H01L29/423;H01L29/49;H01L29/51;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/8247
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