发明名称 METHOD FOR MANUFACTURING MOLD RELEASE FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a mold release film capable of facilitating the detection of foreign matters and defects in a polarizer, an optical retardation polarizing plate and an optical retardation plate for a large- sized TFT(thin film transistor) system or a STN(super twisted nematic) system by a visual inspection. SOLUTION: In the method for manufacturing the mold release film, on which a release layer mainly consisting of a silicone resin is formed by applying a coating liquid containing polydimethylsiloxane having a vinyl group and a hydrogen silane based compound in a specified ratio onto the surface of a polyester film and subsequently thermosetting the liquid, the polyester film satisfies that retardation value (R) is >=1,200 (nm), MOR(maximum oriented ratio) value measured by a microwave transmission molecular orientation meter is 1.3-1.8, difference between the minimum and maximum values of the MOR values is <=0.2 and number of pieces of foreign matters per 310.8 cm2 area is zero in the range of >=25μm and is <=10 in the range of >=5μm and <25μm.
申请公布号 JP2002182037(A) 申请公布日期 2002.06.26
申请号 JP20010221167 申请日期 2001.07.23
申请人 TEIJIN LTD 发明人 MORIMOTO SACHIRO;KOYAMA TOSHIYA
分类号 G02B5/30;B05D7/04;B05D7/24;B29C47/00;B29C55/02;B29K67/00;B29L7/00;B32B27/36;C08J7/04;(IPC1-7):G02B5/30 主分类号 G02B5/30
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