发明名称 |
SELECTIVE TRANSFER METHOD FOR ELEMENT, METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide such a selective transfer method of elements which prevents the impairment of positioning accuracy even after transfer and does not degrade the yield of transfer in transferring the finely worked elements and a method of manufacturing image display device. SOLUTION: The elements, such as plural light emitting diodes 42 and thin- film transistors for liquid crystal display, are formed on a first substrate 41 and thereafter portions of the elements among the plural elements are selectively peeled from the first substrate by element holding layers (thermoplastic resin layers 44) capable of holding the elements by plastic deformation and the respective elements are selectively transferred to a second substrate 43. In the selective transfer, the positions where the elements are held are exactly held by the plastic deformation of the element holding layers and therefore the improvement in the yield is made possible. |
申请公布号 |
JP2002182580(A) |
申请公布日期 |
2002.06.26 |
申请号 |
JP20000382759 |
申请日期 |
2000.12.15 |
申请人 |
SONY CORP |
发明人 |
IWABUCHI TOSHIAKI;YANAGISAWA YOSHIYUKI;OHATA TOYOJI;DOI MASATO |
分类号 |
G02F1/1368;G09F9/00;H01L21/02;H01L21/336;H01L27/12;H01L29/786;H01L33/32;H01L33/48 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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