| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a transfer/exposure method, etc., by which automatic pattern division can be performed and the connecting error between two superimposed pattern layers can be reduced. SOLUTION: At the time of performing complementary division on a device pattern, the total extensions of the X- and Y-direction pattern edges of the whole pattern are calculated first. Then, when, for example, the total extension of the Y-direction pattern edge is longer than that of the X-direction pattern edge, tentative complementary division is performed by drawing tentative dividing lines 21 and 24 in parallel with the X-axis. The interval between the lines 21 and 24 is adjusted to 1/2 of the Y-direction period of the device pattern, because the pattern has periodicity in the Y-direction. Then the dividing lines 21 and 24 are corrected so that all intersections of the lines 21 and 24 with the pattern edges may pass singular points (inflection points).</p> |
