ELECTRON BEAM EXPOSURE SYSTEM AND ELECTRON LENS

摘要

An electron beam exposure system for exposing a pattern on a wafer using a plurality of electron beams, comprising a section for generating a plurality of electron beams, an electron lens section having a plurality of openings for passing a plurality of electron beams and focusing the plurality of electron beams independently, and a coil section provided at at least one of the plurality of openings and forming a magnetic field in a direction substantially perpendicular to the irradiating direction of an electron beam passing through the opening.