发明名称 A NANOMETER POLISHING COMPOSITION AND THE METHOD FOR PREPARING IT
摘要 <p>The invention relates to a polishing composition and a method for preparing it. The polishing composition consists of nanometer diamond powder, nonionic type dispersing stabilizer, antistatic agent, cleaning agent and white oil or naphtha. The method for preparation the polishing agent include: grinding the nanometer diamond into powdery state and drying it, then adding dispersing stabilizer into it, heating the mixture until the mixture was entirely wetted; at last the other components of the polishing agent were added into it, mixing the resultant mixture until it become suspension. The invention nanometer polishing solution can increase surface polishing quality to sub-nanometer degree, especially suitable for polishing and grinding the high quality surface of the computer head, optical instrument, ceramics and so on.</p>
申请公布号 WO2002044292(P1) 申请公布日期 2002.06.06
申请号 CN2001001576 申请日期 2001.11.21
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