发明名称 |
SYNTHETIC QUARTZ GLASS OPTICAL MATERIAL AND OPTICAL MEMBER FOR F 2? EXCIMER LASERS |
摘要 |
<p>An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5x10<16 >molecules/cm<3 >or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2x10<-5 >or lower.</p> |
申请公布号 |
EP1204611(A1) |
申请公布日期 |
2002.05.15 |
申请号 |
EP20010938241 |
申请日期 |
2001.05.28 |
申请人 |
HERAEUS QUARZGLAS GMBH;SHIN-ETSU QUARTZ PRODUCTS CO., LTD. |
发明人 |
FUJINOKI, AKIRA;NISHIMURA, HIROYUKI;YOKOTA, TORU;YAGINUMA, YASUYUKI;SATO, AKIRA;UEDA, TETSUJI |
分类号 |
G02B1/00;C03B19/14;C03B20/00;C03C3/06;C03C4/00;H01L21/027;(IPC1-7):C03C3/06 |
主分类号 |
G02B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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