发明名称 |
Dual dielectric structure for suppressing lateral leakage current in high fill factor arrays |
摘要 |
A structure and method for suppressing lateral leakage current in full fill factor image arrays includes dual dielectric passivation layer. A first passivation layer includes a material that is an insulator, has a low dielectric constant to minimize capacitive coupling between the contacts, and is low stress to prevent cracking. A second passivation layer includes a thin oxide or nitride layer over the first passivation layer.
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申请公布号 |
US6384461(B1) |
申请公布日期 |
2002.05.07 |
申请号 |
US19990419293 |
申请日期 |
1999.10.15 |
申请人 |
XEROX CORPORATION |
发明人 |
LU JENG PING;MEI PING;LEMMI FRANCESCO;STREET ROBERT A.;BOYCE JAMES B. |
分类号 |
H01L27/146;(IPC1-7):H01L31/075;H01L31/105 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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