发明名称 ELECTROOPTICAL DEVICE AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To increase light resistance and to efficiently produce cumulative capacity employing relatively simple laminated structure for an electrooptical device such as a liquid crystal device. SOLUTION: On a TFT array substrate (10) of the device, pixel electrodes (9a), a TFT (30) connected to the electrodes, a scanning line (3a) connected to the TFT, a capacitive line (300) which is made up with the same layer of the scanning line, an interlayer insulation film (41) which is laminated on the capacitive line and the scanning line and an intermediate electrically conductive layer (80) which is laminated on the film are provided. The layer (80) consists of a light shielding electrically conductive film and includes a second capacitive electrode which are placed opposite to a first capacitive electrode that is a portion of the capacitive line across the interlayer insulation film and a light shielding section that at least covers the scanning line partially from the top through the interlayer insulation film. The film is formed so that the film thickness between the first capacitive electrode and the second capacitive electrode is made thinner than that between the scanning line and the light shielding section.</p>
申请公布号 JP2002123192(A) 申请公布日期 2002.04.26
申请号 JP20000318543 申请日期 2000.10.18
申请人 SEIKO EPSON CORP 发明人 MURAIDE MASAO
分类号 G02F1/136;G02F1/1368;G09F9/30;H01L29/786;(IPC1-7):G09F9/30 主分类号 G02F1/136
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