发明名称 Optical correction plate, and its application in a lithographic projection apparatus
摘要 A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the plate have an identical aspherical profile, whose shape has been calculated using the measured distortion map of the lithographic objective. The figuring process applied to the plate uses the principle of polishing in the presence of an elastic deformation, so as to achieve the desired aspherical shape on both sides.
申请公布号 US6373552(B1) 申请公布日期 2002.04.16
申请号 US20000484200 申请日期 2000.01.18
申请人 ASM LITHOGRAPHY B.V. 发明人 BRAAT JOSEPHUS J. M.;VAN DER LAAN CORNELIS J.
分类号 H01L21/027;G03F7/20;(IPC1-7):G03B27/68;G03B27/00;G03B27/32;G03B21/00;G01B11/02 主分类号 H01L21/027
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