ATMOSPHERIC PLASMA CLEANING APPARATUS

摘要

PURPOSE: An atmospheric plasma cleaning apparatus is provided to completely clean the surface of a material to process, by applying a high voltage of an alternate current(AC) or pulse type to a metal electrode in an open space and at an atmospheric pressure. CONSTITUTION: A high voltage generating unit applies the high voltage of an AC or pulse type to one electrode of an electrode cell, and the other electrode functions as a grounded high voltage generating inverter. A plasma cleaning head unit has at least two electrode cells. An insulator is attached to the entire confronting surfaces of an electrode plate constituting a plasma generating space between the insulators wherein the top and bottom of the plasma generating space is open. An equalizer supplies nitrogen gas to a gap among the plasma generating spaces formed between both electrodes of each electrode cell of the plasma cleaning head at uniform flow rate and pressure. A transfer unit(100) continuously transfers the process material to a plasma exhausting hole under the plasma generating space of the electrode cell constituting the plasma cleaning head unit. A nitrogen gas supply unit supplies nitrogen gas to the equalizer.