发明名称 POLISHING FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a polishing film of bonded abrasive-grain type capable of finish polishing of a surface of a precision part with high smoothness, by forming mesh crack taking in polishing trash produced during polishing on a surface of the film, and a manufacturing method therefor. SOLUTION: In a polishing film 10, cerium oxide particle 13 having an average particle diameter in the range of 5 to 50 nm or mixed particles 13, 15 containing the cerium oxide particle, having an average particle diameter in the range of 5 to 50 nm is bonded with resin binder 14, and a polishing layer 12 on the surface of which the mesh crack is formed, is formed on a surface of a base film 11.
申请公布号 JP2002103238(A) 申请公布日期 2002.04.09
申请号 JP20000303134 申请日期 2000.10.03
申请人 NIHON MICRO COATING CO LTD 发明人 KATSURA HEIKO;SAKAMOTO AKIHIRO
分类号 B24D11/00;B24D3/00;B24D3/32;(IPC1-7):B24D11/00 主分类号 B24D11/00
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