发明名称 REAL TIME MONITORING FOR SIMULTANEOUS IMAGING AND EXPOSURE IN CHARGED PARTICLE BEAM SYSTEMS
摘要 <p>A beam processing system, such as a focused ion beam or an electron beam (232) system addressing an arbitrary series of points and receives data from the point in real time. The data can be used to image or to alter the processing, even within a single dwell period, thereby allowing closed feedback loop for processing. A delay calculator (324) automatically determines the delay between instructing the system to move the beam and detecting a signal from the work piece surface so that the detector signal can be matched with the location on the work piece (239) at which the signal was generated.</p>
申请公布号 WO2002025692(A1) 申请公布日期 2002.03.28
申请号 US2001042233 申请日期 2001.09.20
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