| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable material having high sensitivity and low fog and to provide a heat developable material having superior light and heat resistances after heat development. SOLUTION: In the heat developable material with a photosensitive layer containing photosensitive silver halide grains, an organic silver salt, a reducing agent and a binder and a layer adjacent to the photosensitive layer on the base, a polyhalomethane compound having an anthraquinone nucleus is contained in at least one of the layers.
|
