发明名称 METHODS AND APPARATUS FOR PLASMA PROCESSING
摘要 Plasma processing is carried out at pressures of about atmospheric pressure, at pressures below atmospheric pressure, or at pressures above atmospheric pressure. The plasmas are generated using a RF power source and a rectangular waveguide. The plasmas can be used for applications such as materials processing and carrying out chemical reactions.
申请公布号 WO0193315(A3) 申请公布日期 2002.03.21
申请号 WO2001US17266 申请日期 2001.05.25
申请人 JEWETT, RUSSELL, F.;ELSTON, JASON, F. 发明人 JEWETT, RUSSELL, F.;ELSTON, JASON, F.
分类号 H01J37/32;H05H1/30 主分类号 H01J37/32
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