| 发明名称 |
CERAMIC BOARD FOR SEMICONDUCTOR PRODUCTION AND INSPECTION DEVICES |
| 摘要 |
<p>The object of the present invention is to provide a ceramic substrate that can provide a substantially uniform temperature distribution to a surface of the ceramic substrate where a semiconductor wafer is treated. A ceramic substrate for a semiconductor-producing/examining device according to the present invention is a ceramic substrate having a conductor formed on a surface of the ceramic substrate or inside the ceramic substrate, wherein said substrate is containing oxygen and having a disc form, the diameter thereof exceeding 250 mm and a thickness thereof being 25 mm or less. <IMAGE></p> |
| 申请公布号 |
EP1189274(A1) |
申请公布日期 |
2002.03.20 |
| 申请号 |
EP20010902809 |
申请日期 |
2001.02.08 |
| 申请人 |
IBIDEN CO., LTD. |
发明人 |
ITO, YASUTAKA;HIRAMATSU, YASUJI |
| 分类号 |
H01L21/00;H01L21/68;H05B3/14;H05B3/26;H05B3/28;(IPC1-7):H01L21/68;H01L21/66;H05B3/10;H05B3/16;H05B3/18;H05B3/68;C04B35/00 |
主分类号 |
H01L21/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
