RESIN COMPOSITION SENSITIVE TO ACTINIC ENERGY RAY AND METHOD OF FORMING POLYMER PATTERN FROM THE RESIN COMPOSITION

摘要

A resin composition sensitive to actinic energy rays which comprises a multiplying strong-acid generator comprising a 4,4'-isopropylidenebiscyclohexanedisulfonic acid ester represented by the general formula (1) Formula (1) (wherein R1 and R2 each is C1-15 alkyl, C1-8 alkyl which has been substituted by at least three fluorine atoms, or aryl), an acid generator which yields an acid upon irradiation with actinic energy rays, and a polymer which is reactive when catalyzed by an acid; the resin composition which is curable and sensitive to actinic energy rays and in which the polymer which is reactive when catalyzed by an acid is a cationically polymerizable compound; and a method of forming a polymer pattern which comprises using either of these resin compositions sensitive to actinic energy rays.