发明名称 CLEAR POLYSTYRENE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a clear polystyrene resin composition which has good clarity and processibility and can greatly decrease dirt on a metal mold in the molding step. SOLUTION: This composition contains (I) 100 pts.wt. clear polystyrene resin and (II) 0.01-4 pts.wt. pentaerythritol ester compound. The content of a low-mol- wt. polymer having a mol.wt. lower than 350 and contained in a dichloromethane soluble component of the resin (I) is 2.0 wt.% or lower. In the composition, the content X (wt.%) of the pentaerythritol ester compound and the content Y (pts.wt.) of the low-mol.-wt. polymer satisfy the relation represented by: 0.52<X+2Y<4.50.
申请公布号 JP2002053721(A) 申请公布日期 2002.02.19
申请号 JP20010116934 申请日期 2001.04.16
申请人 QIMEI INDUSTRY CO LTD 发明人 HSU RAY-HSI
分类号 C08L25/08;C08F36/04;C08F279/02;C08K5/103;C08L51/04;C08L53/02;(IPC1-7):C08L25/08 主分类号 C08L25/08
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