发明名称 PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To respectively form a first semiconductor device, composed of a thick semiconductor layer and a second semiconductor device composed of a thin semiconductor layer on plural semiconductor layers laminated and formed on the same substrate. SOLUTION: A second alignment mark 409 for forming a second semiconductor device 412 is formed by a first alignment mark 404, used for forming a first semiconductor device 407 on a first semiconductor layer 402. After the first alignment mark 404 and a messa 408 under that mark are removed, the second semiconductor device 412, composed of a second semiconductor layer 403, is formed.
申请公布号 JP2002050757(A) 申请公布日期 2002.02.15
申请号 JP20000236856 申请日期 2000.08.04
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 KITABAYASHI HIROTO
分类号 H01L27/14;H01L21/027;H01L21/06;H01L21/338;H01L21/8232;H01L27/06;H01L27/095;H01L27/15;H01L29/201;H01L29/778;H01L29/812;H01L31/10;H01S5/026;(IPC1-7):H01L29/778;H01L21/823 主分类号 H01L27/14
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