发明名称 POLISHING PAD AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a polishing pad capable of obtaining stable grinding performance. SOLUTION: A sheet including one and more kinds of abrasive grains is spirally wound in a cylindrical shape, and a cutting surface thereof is used as a grinding surface.
申请公布号 JP2002036129(A) 申请公布日期 2002.02.05
申请号 JP20000223541 申请日期 2000.07.25
申请人 ROKI TECHNO CO LTD 发明人 TOMINAGA SHIGERU;SUZUKI MAKOTO
分类号 B24B37/20;B24B37/22;B24D11/00;H01L21/304 主分类号 B24B37/20
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