发明名称 Semiconductor device and method for manufacturing the same
摘要 A semiconductor device comprises a convex semiconductor layer provided on a semiconductor substrate, a source region and a drain region provided in the convex semiconductor layer, and a gate electrode. The gate electrode has a side-wall gate portion provided over a side surface of the convex semiconductor layer in an insulated state with respect to the convex semiconductor layer.
申请公布号 US2002011612(A1) 申请公布日期 2002.01.31
申请号 US20010916509 申请日期 2001.07.30
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HIEDA KATSUHIKO
分类号 H01L21/336;H01L21/8238;H01L21/8242;H01L21/84;H01L27/092;H01L27/108;H01L27/12;H01L29/786;(IPC1-7):H01L29/80;H01L31/112 主分类号 H01L21/336
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