| 摘要 |
<p>An etching composition which comprises an aqueous solution containing oxalic acid and an aromatic hydrocarbon compound having a phenolic hydroxyl group; and an etching composition characterized by being an aqueous solution containing oxalic acid and a nitrogenous carboxylic acid and/or salt thereof. With the etchants, etching can be conducted under mild conditions without generating any etching residue.</p> |
