Method of fabricating a nickel etching mask

摘要

There is provided a metal etching mask fabrication method. Chrome is first sputtered on a silica layer and a photoresist is deposited to be thick on the chrome layer. The photoresist layer is patterned, first nickel is sputtered on the photoresist pattern layer, and a second nickel layer is formed on the first nickel layer by plating. The photoresist pattern layer and the first nickel layer formed on the photoresist pattern layer are removed using acetone, and the chrome layer is removed by dry etching in plasma using a gas. <IMAGE> <IMAGE> <IMAGE> <IMAGE> <IMAGE> <IMAGE> <IMAGE>