发明名称 Step and flash imprint lithography
摘要 A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable fluid composition with a mold having a relief structure formed therein such that the polymerizable fluid composition fills the relief structure in the mold. The polymerizable fluid composition is subjected to conditions to polymerize polymerizable fluid composition and form a solidified polymeric material therefrom on the transfer layer. The mold is then separated from the solid polymeric material such that a replica of the relief structure in the mold is formed in the solidified polymeric material; and the transfer layer and the solidified polymeric material are subjected to an environment to selectively etch the transfer layer relative to the solidified polymeric material such that a relief image is formed in the transfer layer.
申请公布号 US6334960(B1) 申请公布日期 2002.01.01
申请号 US19990266663 申请日期 1999.03.11
申请人 BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM 发明人 WILLSON CARLTON GRANT;COLBURN MATTHEW EARL
分类号 G03F7/038;B29C31/00;B81C1/00;G03F7/00;H01L21/027;H01L21/30;H01L21/302;H01L21/3065;H05K3/06;(IPC1-7):B44C1/22 主分类号 G03F7/038
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