| 摘要 |
A projection exposure apparatus for illuminating a pattern of a mask with illumination light from an illumination system and for projecting an image of the pattern onto a substrate through a projection optical system. The apparatus includes a masking device included in the illumination system and disposed on a plane optically conjugate with a plane on which the pattern of the mask is disposed, the masking device having a variable-size aperture for defining an exposure area in an image plane of the projection optical system, and an illuminometer disposed at the image plane side of the projection optical system. The illuminometer is movable along the image plane while a light receiving surface thereof is registered with a plane displaced from the image plane to detect a light intensity distribution on the displaced plane when the masking device provides a small aperture. The illumination system includes a movable component for adjusting a light intensity distribution of the displaced plane.
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