RADIATION SENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having a wide process margin and shelf stability and capable of forming an interlayer insulation film and microlenses excellent in heat and solvent resistances and transparency, and to provide an interlayer insulation film and microlenses obtained from the composition. SOLUTION: The radiation sensitive resin composition contains [A] a copolymer of (a1) an unsaturated carboxylic acid and/or its anhydride, (a2) a specified monomer containing an oxetanyl group and (a3) an olefinically unsaturated compound other than the components (a) and (a2) and [B] a 1,2-quinonediazido compound.