发明名称 FABRICATING METHOD OF HIGH-TEMPERATURE SUPERCONDUCTING FILM
摘要 PROBLEM TO BE SOLVED: To restrict oxidation and dispersion of a metallic substrate, and to increase a range of material selection for a substrate and a buffer layer. SOLUTION: A fabricating method of a high-temperature superconducting film is comprised of: a precursor fabrication step (step 1), in which a precursor is fabricated on a substrate by using a material to be an evaporation source; and a heat treatment step (step 2), in which a heat treatment is performed on the substrate on which a precursor has been fabricated to fabricate an oxide superconducting film. The material to be an evaporation source includes a fluoride. The heat treatment step is performed by setting a temperature of the substrate Tb of which range is 400 deg.C<=Tb<=750 deg.C, in a vacuum atmosphere, in which a total pressure P range is P<=10 mTorr (about 1.33 Pa) and a partial pressure range of oxygen Po is 0.1 mTorr (about 1.33×10-2 Pa)<=Po<=10 mTorr (about 1.33 Pa).
申请公布号 JP2001332145(A) 申请公布日期 2001.11.30
申请号 JP20000148764 申请日期 2000.05.19
申请人 CENTRAL RES INST OF ELECTRIC POWER IND 发明人 ICHINOSE ATARU;AKITA MITSUGI
分类号 C23C14/08;H01B12/06;H01B13/00;H01L39/24;(IPC1-7):H01B13/00 主分类号 C23C14/08
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