| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming device for film coated powder which is capable of stably setting mechanical agitating conditions, ultrasonic dispersion conditions, a dropping rate for neutralization of an acid and alkali, heating conditions, or the like, under optimum conditions and forming coating films of a uniform thickness on substrate surfaces and is capable of desirably controlling the film thicknesses without the aggregation and solidification of the film coated powder with each other even when magnetic materials are used as the substrate without the deposition of only solid phase in a liquid phase in manufacture of the film coated powder by aqueous system reaction film formation. SOLUTION: The film forming device for forming the films on the surfaces of the substrate particles has a reaction chamber 1 having means for preventing the aggregation of contents and the means for preventing the aggregation is an ultrasonic wave oscillation machine. |
