发明名称 Semiconductor device and method of manufacturing the same
摘要 An objective of the present invention is to realize a comparator which uses MOS transistors and has a reduced offset voltage and occupies a small surface area. This is characterized in that an impurity is introduced into a channel region of a MOS transistor, the mobility of a load side MOS transistor is made smaller than the mobility of a differential side MOS transistor, and the mutual conductance of the load side MOS transistor is made smaller than the mutual conductance of the differential side MOS transistor.
申请公布号 US2001040259(A1) 申请公布日期 2001.11.15
申请号 US20000548123 申请日期 2000.04.12
申请人 SHIIKI MIKA;KITAMURA KENJI 发明人 SHIIKI MIKA;KITAMURA KENJI
分类号 H01L21/8234;G01R19/165;G01R31/28;H01L21/8238;H01L27/088;H03F3/45;(IPC1-7):H01L29/76;H01L31/062 主分类号 H01L21/8234
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