| 摘要 |
PROBLEM TO BE SOLVED: To enhance the yield by eliminating standing gas at the central part of an electrode. SOLUTION: Plate electrodes are disposed oppositely and in parallel with each other in a reaction chamber, a substrate is placed on the lower electrode and processing gas is blown to the substrate from a large number of gas supply holes 7 made in the upper electrode. While discharging gas in the reaction chamber radially and uniformly to the outside of the substrate from an annular exhaust opening secured to surround the substrate on the lower electrode, a plasma is generated between the electrodes by applying high frequency power between the opposite plate electrodes and utilized for processing the substrate placed on the lower electrode. In such a plasma processing system, the upper electrode 14 is additionally provided with a gas supply hole 17 substantially at the central position thereof with reference to the annular exhaust opening secured to surround the substrate. |
