| 摘要 |
PROBLEM TO BE SOLVED: To provide a diffraction optical element with excellent transmittance for short wavelength light, especially for an F2 excimer laser beam, with high resolution and with reduced chromatic aberration, an aligner using the same, a method for manufacturing the device and a method for maintaining a semiconductor manufacturing factory and the aligner. SOLUTION: At least a part of the diffraction optical element is provided with at least one selected from fluorine doped quartz, anhydrous quartz and fluorine doped anhydrous quartz. Also the aligner, being an aligner having an optical system containing a diffraction optical element such as a BO element to project the original plate pattern illuminated with light from the light source on the substrate, is characterized by having the diffraction optical element. Furthermore, the maintenance information of the aligner is data communicated via a computer network by equipping the aligner with a display, a network interface and the computer to execute the software for the network.
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