发明名称 METHOD AND APPARATUS FOR THERMAL PROCESSING A PHOTOSENSITIVE ELEMENT
摘要 A method and apparatus for thermal processing a photosensitive element includes heating a composition layer on a flexible substrate to a melt temperature of an unirradiated area of the composition layer and maintaining the flexible substrate at a temperature below the melt temperature while pressing a heated absorbent layer against the heated composition layer, and repeating these steps for multiple cycles. A further embodiment of the method includes a step of cooling the flexible substrate and layer laminate on each cycle to maintain the flexible substrate at the desired temperature below that of the heated composition layer.
申请公布号 WO0118604(A3) 申请公布日期 2001.09.20
申请号 WO2000US24400 申请日期 2000.09.06
申请人 E. I. DU PONT DE NEMOURS AND COMPANY;JOHNSON, MELVIN, HARRY;BELFIORE, DAVID, ANTHONY;HACKLER, MARK, A.;KANNURPATTI, ANANDKUMAR, RAMAKRISHNAN;BROWN, ROBERT, LEE;CUSHNER, STEPHEN;DRURY, ROBERT, FINLEY 发明人 JOHNSON, MELVIN, HARRY;BELFIORE, DAVID, ANTHONY;HACKLER, MARK, A.;KANNURPATTI, ANANDKUMAR, RAMAKRISHNAN;BROWN, ROBERT, LEE;CUSHNER, STEPHEN;DRURY, ROBERT, FINLEY
分类号 G03F7/004;G03F7/00;G03F7/34;G03F7/36;(IPC1-7):G03F7/34 主分类号 G03F7/004
代理机构 代理人
主权项
地址