发明名称 METHOD OF MANUFACTURING TRANSISTOR ARRAY SUBSTRATE AND METHOD OF MANUFACTURING OPTOELECTRIC DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of manufacturing a TFT array substrate and an optoelectric device, in which cost can be reduced by performing an highly accurate inspection equivalent to a lighting inspection in a stage of TFT array substrate. SOLUTION: In a manufacturing method of a liquid crystal device, in the stage of completion of manufacturing the TFT array 200, the substrate is checked for a operation before a panel is assembled. That is, a data drive circuit 60 and a scanning line drive circuit 70 are supplied with power or signals from an input/output terminal 45 of the TFT array substrate 200 to actuate TFTs 10A, 10B and 10C, and it is inspected as to whether a very weak light with a wavelength between a visual region and a near-infrared region is generated on the TFT array substrate 200 by emission microscope.</p>
申请公布号 JP2001237429(A) 申请公布日期 2001.08.31
申请号 JP20000046388 申请日期 2000.02.23
申请人 SEIKO EPSON CORP 发明人 HIRAIWA TAKU
分类号 G02F1/13;G02F1/136;G02F1/1368;H01L29/786;(IPC1-7):H01L29/786 主分类号 G02F1/13
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