发明名称 METHOD FOR CHEMICAL VAPOR DEPOSITION OF TITANIUM FILMS
摘要 <p>A method of conditioning a deposition chamber. The method comprises performing a pre-coat step (208) and a plasma treatment step (210). The pre-coat step deposits a material layer upon interior surfaces of the chamber and its interior components, while the plasma treatment step further reduces the amount of undesirable residual gases.</p>
申请公布号 WO2001063004(A1) 申请公布日期 2001.08.30
申请号 US2001004777 申请日期 2001.02.14
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