发明名称 Multi-phase lead germanate film deposition method
摘要 A MOCVD deposition process has been provided for the deposition of an improved PGO ferroelectric film. The inclusion of a second phase of Pb3GeO5, along with the first phase of Pb5Ge3O11, provides the film with some ferroelastic properties which direct correspond to improved ferroelectric characteristics. The inclusion of the second phase regulates to first phase crystal grain size and promotes the preferred c-axis orientation of the grains. The degree of second phase Pb3GeO5 is regulated by controlling the amount of lead in the precursor, and with additional lead added to the reactor along the oxygen used to oxidize the lead-germanium film. Critical post-deposition annealing process are also described which optimize the ferroelectric properties of the PGO film. A multi-phase PGO film and capacitor structure including multi-phase PGO film of the present invention are provided by means of the invention.
申请公布号 US6281022(B1) 申请公布日期 2001.08.28
申请号 US20000704496 申请日期 2000.11.01
申请人 SHARP LABORATORIES OF AMERICA, INC. 发明人 LI TINGKAI;ZHANG FENGYAN;HSU SHENG TENG
分类号 C30B29/22;C01G17/00;C23C16/40;C23C16/56;C30B29/32;H01L21/02;H01L21/205;H01L21/31;H01L21/316;H01L21/8242;H01L21/8246;H01L21/8247;H01L27/10;H01L27/105;H01L27/108;H01L29/788;H01L29/792;H01L37/02;H01L41/187;(IPC1-7):H01L21/00 主分类号 C30B29/22
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