发明名称 CONFIGURATION MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a configuration measuring apparatus capable of accurately measuring the configuration of the surface to be observed of the subject of measurement and of being miniaturized and made lightweight as a whole. SOLUTION: A phase-shifted interference fringe image simultaneous measuring apparatus 100 is comprised mainly of a source 11 of laser beams, a total reflection mirror 15, a beam splitter 21, a reference plane 23, aλ/4 wavelength plate 24, a triaxial diffraction prism 32, and a single image pickup device 36. The beam from the source 11 of laser beams is reflected by the total reflection mirror 15 and transmitted through the beam splitter 21. The beam reflected from the surface of the reference plane 23 is used as a reference beam, which is reflected by the beam splitter 21, together with a non-interfering beam including a measuring beam coming from the surface 102 to be inspected of the subject of measurement 101. After the optically non-interfering beam reflected by the beam splitter 21 is transmitted through anotherλ/4 wavelength plate 31, it is diffracted by the triaxial diffraction prism 32 into a first diffracted beam 41, a second diffracted beam 42, and a third diffracted beam 43, all of which are applied to the single image pickup device 36. The image pickup device 36 thus acquires three images of interference fringes.
申请公布号 JP2001227927(A) 申请公布日期 2001.08.24
申请号 JP20000041620 申请日期 2000.02.18
申请人 MITSUTOYO CORP 发明人 MITSUYA NAOKI;HANDA HIROHISA;KAWASAKI KAZUHIKO;HAINO HIROSHI
分类号 G01B9/02;G01B11/24;(IPC1-7):G01B11/24 主分类号 G01B9/02
代理机构 代理人
主权项
地址