| 摘要 |
A composition for barrier ribs of plasma display panels and to a method of fabricating such barrier ribs using the composition is disclosed. The composition for the barrier ribs is SiO2-ZnO-PbO-B2O3 based glass. The SiO2-ZnO-PbO-B2O3 based glass consists of 10~20 wt % of SiO2, 10~30 wt % of ZnO, 5~30 wt % of PbO, 10~30 wt % of B2O3, 2~10 wt % of K2O, 0~5 wt % of Li2O, 1~5 wt % of CaO, 3~8 wt % of Na2O, 1~5 wt % of Al2O3, and 0~2 wt % of Sb2O3. In the method of forming the barrier ribs, the SiO2-ZnO-PbO-B2O3 based glass powder free from an oxide filler is primarily prepared. Paste or slurry is formed by mixing the SiO2-ZnO-PbO-B2O3 based glass with an organic vehicle. A thick film, having a predetermined thickness, is formed on the top surface of a lower substrate using the paste or slurry. Desired barrier ribs are, thereafter, formed by processing the paste or slurry film. In the barrier rib formation step, a pattern is formed on the top surface of the paste or slurry film before the paste or slurry film is etched or abraded using the pattern as a mask. The barrier ribs may be formed by stamping the paste or slurry film using a mold having a shape opposed to the desired pattern of the barrier ribs. The barrier ribs may be also formed by patterning a photoresist paste or slurry film. |
