| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a shadow mask which can suppress a generation of line irregularity in a shadow mask and has good edge shape of thru hole of an opening mask and less dispersion of electron beam transmissivity. SOLUTION: In the method of manufacturing the shadow mask, the opening mask having a small hole mask 25 and a large hole mask 26 is formed by carrying out etching to both sides of a long belt shaped metal base material 21 made of Fe-Ni invar alloy using an etching solution formed from ferric chloride solution. The shadow mask manufactured using the first etching solution having the specific gravity of 1.5 at temperature not less than 70 deg.C as the etching solution for forming the small hole mask 25, and the second etching solution having the specific gravity of 1.45 to 1.50 at temperature of 55 deg.C to 65 deg.C as the etching solution for forming the large hole mask 26.
|
