BRUSH ASSEMBLY FOR CLEANING WAFER

摘要

PURPOSE: A brush assembly for cleaning a wafer is provided to clean uniformly a surface of a wafer by increasing a cleaning power to a center portion of the wafer. CONSTITUTION: The first rotation shaft(110) and the second rotation shaft(120) are extended parallel to each other. A driving unit(200) is formed to drive the first and the second rotation shafts(110,120) toward an opposite direction to each other. The first end portions of the first and the second rotation shafts(110,120) are combined with the driving unit(200). The second end portions of the first and the second rotation shafts(110,120) are combined with a bearing unit(150). The first and the second brush units(130,140) are adhered to predetermined portions of the first and the second rotation shafts(110,120). A wafer(10) is rotated by a wafer driving portion(20).