发明名称 COATING LIQUID FOR FORMING FILM
摘要 PURPOSE: A coating liquid which can be used for preparing insulative film, protective film and etc. for semiconductor assembly, also which is excellent in solubility, safety and coating capability, is provided. CONSTITUTION: The coating liquid contains a polymer bearing an aromatic ring in the main chain and at least two organic solvents. The difference between the highest boiling point and the lowest boiling point in the solvents is more than 20deg.C. The coating liquid contains a polymer bearing an aromatic ring in the main chain, phenyl ether, and organic solvent having a viscosity of below 1.0 cP at 20deg.C under atmospheric pressure. The phenyl ether is selected from group consisting of anisole, phenetol and methoxytoluene. The liquid is used to coat insulative film, photoresist film and insoluble film.
申请公布号 KR20010067143(A) 申请公布日期 2001.07.12
申请号 KR20000051814 申请日期 2000.09.02
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 CHOI, HYON CHUL;YOKOTA AKIRA;YOSHIDA YUJI
分类号 G03F7/00;B44D7/00;C09D187/00;H01L21/30 主分类号 G03F7/00
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