发明名称 Silicide agglomeration fuse device
摘要 A fusible link device disposed on a semiconductor substrate for providing discretionary electrical connections. The fusible link device of the invention includes a silicide layer and a polysilicon layer formed on the silicide layer and has a first un-programmed resistance. The silicide layer agglomerates to form an electrical discontinuity in response to a predetermined programming potential being applied across the suicide layer, such that the resistance of the fusible link device can be selectively increased to a second programmed resistance.
申请公布号 US6258700(B1) 申请公布日期 2001.07.10
申请号 US19990313830 申请日期 1999.05.18
申请人 INTEL CORPORATION 发明人 BOHR MARK T.;ALAVI MOHSEN
分类号 H01L21/82;H01L23/525;(IPC1-7):H01L21/326 主分类号 H01L21/82
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