CHEMICAL VAPOR DEPOSITION METHOD AND COATINGS PRODUCED THEREFROM

摘要

A modified chemical vapor deposition (CVD) method and various coatings formed by this method are disclosed. A uniform coating is obtained by the disclosed CVD method by redirecting the energy source and/or the hot gasses produced thereby. The methods disclosed are particularly useful for forming thin film, insulative, oxide coatings on the surface of conductive or superconductive wires. The redirect methods are also useful for producing powders that can be collected for further processing. Metal oxide barrier coatings for polymer food containers are also disclosed.