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发明名称
Method and system for reducing damage to substrates during plasma processing with a resonator source
摘要
申请公布号
AU2577001(A)
申请公布日期
2001.07.03
申请号
AU20010025770
申请日期
2000.12.20
申请人
TOKYO ELECTRON LIMITED
发明人
WAYNE L. JOHNSON;MURRAY D. SIRKIS
分类号
C23C16/507;H01J37/32
主分类号
C23C16/507
代理机构
代理人
主权项
地址
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