发明名称 PERIPHERAL EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To improve the throughput of an optical edge bead removing device. SOLUTION: Light source units 14A and 14B are movable in±X direction in the diagram along a support member 12. While a beam is emitted from the light source units 14A and 14B, the support member 12 is travelled in±Y direction in the diagram, so that a photoresist in the periphery of a glass board G is exposed. When the light source units 14A and 14B move in the±X direction along the supporting member 12, a distance between the light source units 14A and 14B is controlled to be a specified value or more. Masks 16A and 16B are driven in the±X direction in the diagram, and when there is a part in an area subject to peripheral exposure that requires no irradiation, the masks 16A and 16B cover the glass board G partly to shield the light.
申请公布号 JP2001176785(A) 申请公布日期 2001.06.29
申请号 JP19990361617 申请日期 1999.12.20
申请人 ORC MFG CO LTD;NIKON CORP 发明人 MORITA AKIRA;SATO HIROAKI;ITO MASAYUKI;NARAKI TAKESHI
分类号 H01L21/027;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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