摘要 |
Compounds of the formulae I, II, III, IV and V (see formulas I, II, III, IV and V) wherein R1 is is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 i s for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S - phenyl or NR5R6- phenyl, each of which optionally is substituted; or Ar1 is is (see formula V I) optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbony l or pyrene- carbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5- trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 is is (see formula VII) optionally substitute d, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 wh en x is 2, for ex- ample is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is (see formula VIII) M3 is for example C1- C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1- C12alkyl; R3' is is C1-C12alkyl; substituted or -O-interrupted C2-C6alkyl; R 4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other is are hydrogen, C1- C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.
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申请人 |
CIBA SPECIALTY CHEMICALS HOLDING INC. |
发明人 |
BIRBAUM, JEAN-LUC;TANABE, JUNICHI;OHWA, MASAKI;KURA, HISATOSHI;KUNIMOTO, KAZUHIKO;OKA, HIDETAKA |