发明名称 |
Method and apparatus for immersion treatment of semiconductor and other devices |
摘要 |
Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out the cleaning method.
|
申请公布号 |
US6244280(B1) |
申请公布日期 |
2001.06.12 |
申请号 |
US19990442574 |
申请日期 |
1999.11.18 |
申请人 |
SPEEDFAM-IPEC CORPORATION |
发明人 |
DRYER PAUL WILLIAM;TIRENDI RICHARD SCOTT;SUNDIN JAMES BRADLEY |
分类号 |
B08B3/10;B01D19/00;B01D61/00;B08B3/04;H01L21/00;H01L21/304;(IPC1-7):B08B3/02 |
主分类号 |
B08B3/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|