| 摘要 |
PURPOSE: A method for fabricating a black matrix of a plasma display panel is provided to reduce fabricating costs of a black matrix by improving a fabricating process of the black matrix. CONSTITUTION: A metallic oxide including ZnO is formed on a substrate(100). An upper electrode(110,100') is completed by forming a transparent electrode thereon. A thin metal layer(120,120') is formed on a black matrix formation portion of the substrate(100) by performing an electroless plating process for the substrate(100). A process for catalyzing a surface of the metallic oxide layer is performed during 5 to 10 minutes within a PbCl2 solution before the electroless plating process is performed. The electroless plating process is performed by exposing the surface of the metallic oxide into CuSO4 solution during 1 minute. |
