发明名称 |
Semiconductor TFT, producing method thereof, semiconductor TFT array substrate and liquid crystal display using the same |
摘要 |
A TFT of the present invention includes an insulating substrate, a first conductive film layer which is to be a gate electrode provided on the insulating substrate, a first insulating film layer which is to be a gate insulating film layer provided on the first conductive film layer, a non-doped semiconductor layer formed on the first insulating film layer, and a second conductive film layer which is to be a source electrode formed on a source region of the semiconductor layer and a drain electrode formed on a drain region of the semiconductor, wherein a junction is formed by implanting an n-type impurity in the source region of the semiconductor layer and the drain region of the semiconductor.
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申请公布号 |
US6225644(B1) |
申请公布日期 |
2001.05.01 |
申请号 |
US19980013938 |
申请日期 |
1998.01.27 |
申请人 |
ADVANCED DISPLAY INC. |
发明人 |
YAMAGUCHI TAKEHISA;NAKAYAMA AKIO |
分类号 |
G02F1/1368;H01L21/336;H01L29/786;(IPC1-7):H01L29/04;H01L31/036;H01L31/037;H01L31/20 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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