发明名称 Production of a dense mist of micrometric droplets in particular for extreme uv lithography
摘要 Process and device for the generation of a fog of micrometric and submicrometric droplets, which may find application to the generation of light in the extreme ultraviolet range, particularly for lithography. According to the process and device, a pressurized liquid is injected into a very small diameter nozzle opening up into a vacuum. Light is generated by focusing laser radiation onto the fog.
申请公布号 AU7801900(A) 申请公布日期 2001.04.30
申请号 AU20000078019 申请日期 2000.10.09
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 MARTIN SCHMIDT;OLIVIER SUBLEMONTIER
分类号 G21K5/02;B05B1/00;B05B17/00;G03F7/20;G21K5/08;G21K7/00;H01L21/027;H05G2/00 主分类号 G21K5/02
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