发明名称 |
Production of a dense mist of micrometric droplets in particular for extreme uv lithography |
摘要 |
Process and device for the generation of a fog of micrometric and submicrometric droplets, which may find application to the generation of light in the extreme ultraviolet range, particularly for lithography. According to the process and device, a pressurized liquid is injected into a very small diameter nozzle opening up into a vacuum. Light is generated by focusing laser radiation onto the fog. |
申请公布号 |
AU7801900(A) |
申请公布日期 |
2001.04.30 |
申请号 |
AU20000078019 |
申请日期 |
2000.10.09 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
MARTIN SCHMIDT;OLIVIER SUBLEMONTIER |
分类号 |
G21K5/02;B05B1/00;B05B17/00;G03F7/20;G21K5/08;G21K7/00;H01L21/027;H05G2/00 |
主分类号 |
G21K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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